Sono-Tek will be exhibiting at The 27th IEEE International Conference on Micro Electro Mechanical Systems (MEMS 2014) 2014 in San Francisco, CA on January 27, with Pragmatics Technologies, Booth #8. The expanding MEMs market is driving the need for uniform and precise deposition of photoresist into high aspect ratio trenches. Conventional spin photoresist techniques struggle to provide the required 2-8 inch uniform coating onto all trench surfaces. Sono-Tek ultrasonic spray systems are proven for coating difficult vertical trenches with uniform thin films of photoresist.
Stop by Booth #8 to learn more, or visit http://www.sono-tek.com/photoresist-spray-equipment/ for more information about our full coating solutions for R&D and production volume MEMs manufacturing.