Sono-Tek will be exhibiting at Semicon West 2014 July 8-10, 2014 in San Fransciso, CA, in booth 942. We will be highlighting our ultrasonic spray systems for direct spray coating of photoresist onto MEMs, particularly difficult to coat high aspect ratios where traditional spin coating methods are not able to provide uniform thin film coatings. Our ultrasonic nozzle systems are easily integrated into production scale equipment, and are proven successful for trenches as high as 1:3 aspect ratios. Ultrasonic spray is a simple, cost effective and repeatable process solution for coating MEMs with photoresist. Atomized droplets have a very tight drop distribution and very little kinetic energy. With the addition of low velocity air shaping, droplets have just enough momentum to settle on all surfaces uniformly.
For more information about the show, visit http://www.semiconwest.org/
For more information about Sono-Tek’s spray equipment for depositing photoresist onto MEMs wafers, go to http://www.sono-tek.com/photoresist-coating/