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ULTRASONIC ATOMIZATION - Using high-frequency sound vibrations, ultrasonic nozzles create a soft spray without bounceback from the substrate, unlike pressure nozzles. When combined with low-pressure air (typically 1 psi), the atomized spray can be shaped in a variety of fan-shaped or conical spray patterns. The type of air shaping method used is dictated by the specific needs of each process. Capability to coat unlimited widths with multiple nozzle systems.
Ultrasonic Nozzle Systems for Solar Cell Manufacturing
Sono-Tek offers ultrasonic coating solutions for both thin film (flexible and non-flexible) and conventional silicon solar cell applications:
Selective fluxing of solder bus lines on photovoltaic Si cells
Precise, targeted deposition and controlled velocity of the flux spray confines the flux to solder bus areas without overspray onto other areas of the cell. The ultrasonic vibration of the SelectaFlux nozzle makes it impossible for the nozzle to clogg, with only a monthly cleaning recommended.
Nanocoatings onto thin film solar cells
Sono-Tek ultrasonic coating systems are ideal for R&D applications spraying thin film nanosuspensions for active layers, TCO, PEDOT
and anti-reflection layers, as well as quantum dots. The ultrasonic vibration of the nozzle breaks apart agglomerated particles (a common problem with nanosuspensions), creating highly uniform coatings from several microns to nanolayer thicknesses. Systems are available for both high temp and low temp processes and spray pyrolysis techniques.
Sono-Tek nozzles are also proven effective for spraying uniform coatings of carbon nanotubes, and are particularly effective in breaking apart agglomerations for the highest degree of uniformity and desirable coating morphologies for CNT coatings.
Examples of solutions sprayed onto flexible and non-flexible base substrates such as glass, stainless steel, conductive foils and other films:
- Amorphous Silicon
- Copper Indium Gallium Selenide (CIGS)
- Cadmium Telluride (CdTe)
- Cadmium Sulphide (CdS)
- Gallium Arsenide (GaAs)
Uniform coatings of liquid dopant solgel solutions, phosphoric acid solutions, titanium and zinc oxides for N-type and P-type silicon wafers
Sono-Tek offers several options for scalable doping processes, from fully enclosed R&D systems such as the ExactaCoat SC to inline systems such as our HyperSonic high speed reciprocating system for continuous high volume production. Advantages over traditional
POCl3 batch doping processes:
- Reduced cycle time with continuous inline process
- Uniform thin films readily adhere to silicon surface
- High speed reciprocator optimized for doping processes
Anti-reflective coatings for reducing surface reflection and maximizing cell efficicency
Sono-Tek ultrasonic nozzles are used to apply thin film and nanocoatings such as Silicon Monoxide (SiO) to reduce surface reflection and increase cell efficiencies.
- Sono-Tek ultrasonic nozzles feature:
- Up to 80% reduction in material consumption
- Reduced wasteful overspray and atmospheric contamination
- Minimal servicing and downtime
- Spray patterns that are easily shaped for precise coating applications
- Highly controllable spray that produces reliable, consistent results
- Non-clogging
- No moving parts to wear out
- Ultra-low flow rate capabilities, intermittent or continuous
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