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ChemCoat Si

ChemCoat Si
Inline Silicon Doping Ultrasonic Spray System for Solar Manufacturing


ChemCoat Si for silicon doping is a cost effective alternative to tube furnace BBr3 boron diffusion for P-type silicon or POCL doping for N-type silicon wafers. Sono-Tek ultrasonic spray systems reduce manufacturing equipment costs, providing uniform thin films of Boric acid onto P-type wafers or phosphoric acid onto N-type wafers prior to inline diffusion furnace processes.

ChemCoat Si for Silicon Doping Processes Features:

  • 38” (965 mm) spray coverage with 5 independent wafer sensors
  • WideTrack stationary spray heads are proven for continuous wide area manufacturing lines
  • Fully integrateable with high volume production lines
  • Touch screen HMI interface for system monitoring and recipe management
  • Chemically resistant nozzle technology
  • Acid resistant long life polypropylene conveyor with positive locking drive for self-alignment
  • Selective spray control for 1, 3 or 5 wafer width spray coverage

ChemCoat Si Interior
ChemCoat Spray Shaping

Multiple nozzles create wide area spray patterns with seamless uniform coverage.

ChemCoat Spray Shaping

Fully enclosed spray chamber houses 3 WideTrack spray heads.

Ultrasonic nozzles feature high transfer efficiency and highly uniform thin films of micron sized droplets. The soft, low velocity spray readily adheres to substrates without clogging. ChemCoat Si incorporates chemically resistant nozzles which use proprietary materials of construction to protect the wetted path of the ultrasonic nozzle from acidic solutions.

Operating Principle: The ChemCoat Si inline silicon doping system senses the presence of wafers on the conveyor, precisely timing ultrasonic spray sequence to minimize overspray. The touch screen inter-face allows operators to program and run recipes as well as monitor real-time system conditions with on-screen alarm alerts. The enclosed spray area houses 3 WideTrack dual jet spray shaping assemblies with corrosive resistant ultrasonic atomizing nozzles. The system is exhausted below the spray chamber and any residual acid solution is collected in a tray in the machine basin. The conveyor is configured with a cleaning system including a DI water basin with pH monitoring conductivity sensor which alarms when solution purge is required. A minimal wipe down is required weekly to prevent potential buildup of material on system components.

WideTrack Spray Shaping: ChemCoat uses WideTrack spray shaping technology to produce a wide, uniform spray pattern.



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